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Low charge density electrostatic atomizationKELLY, A. J.IEEE transactions on industry applications. 1984, Vol 20, Num 2, pp 267-273, issn 0093-9994Conference Paper

COMBUSTION MIXTE DU GAZ NATUREL ET DU MAZOUT. = MIXED COMBUSTION OF NATURAL GAS AND FUEL OILPORTRAIT LM.1975; TECH. MOD.; FR.; DA. 1975; VOL. 67; NO 7-8; PP. 38-44 (5P.); BIBL. 3 REF.Article

SUR LA FORMATION RETARDEE D'IONS A L'EXTERIEUR D'UNE CIBLE SOUMISE A UN BOMBARDEMENT IONIQUEBERNHEIM M; BLAISE G; SLODZIAN G et al.1973; INTERNATION. J. MASS SPECTROM. ION PHYS.; NETHERL.; DA. 1973; VOL. 10; NO 3; PP. 293-308; ABS. ANGL.; BIBL. 20 REF.Serial Issue

LES DIELECTRIQUES EN COUCHES MINCES PAR PULVERISATION CATHODIQUEREIBER LM.sdIN: C.R. SYMP. PULVERISATION CATHOD. APPL.; NICE; 1972; PARIS; MAPREN; DA. S.D.; PP. 53-90; BIBL. 2 P.Conference Paper

THE ENERGY SPECTRA OF SPUTTERED IONSDENNIS E; MACDONALD RJ.1972; RAD. EFFECTS; G.B.; DA. 1972; VOL. 13; NO 3; PP. 243-248; BIBL. 8 REF.Serial Issue

DEPOT DE STRUCTURES MULTICOUCHES A L'AIDE D'UN DISPOSITIF DE PULVERISATION IONIQUE HAUTE FREQUENCE COMPORTANT DEUX CIBLESOBUCHOWICZ F; KAZIMIERCZUK W.1974; PRACE OSRODKA BADAWCZO-ROZWOJOW. ELEKTRON. PROZNIOW.; POLSKA; DA. 1974; VOL. 1; NO 1; PP. 71-77; ABS. ANGL. RUSSE; BIBL. 5 REF.Article

CHARGED PARTICLE SPUTTERING: DISTORTION OF TRAJECTORIES BY THE INCIDENT BEAM FIELDBRYCE P; KELLY JC.1972; J. PHYS.; G.B.; DA. 1972; VOL. 5; NO 13; PP. 1604-1614; BIBL. 6 REF.Serial Issue

Elaboration de couches minces métalliques par méthodes ioniques: caractérisation des films et de leurs interfaces = Metal layers deposited by ion methods: characterization of the films and of the contactsMeyer Cubaud, François; Gautherin, Guy.1989, 341 p.Thesis

Oversprayarme Spritzlackiertechnik : Auftragungswirkungsgrad und Schichtdickenverteilung der pneumatischen Spritzlackierung vorhersagen, Teil 1 = Spray lacquering technique with little overspray : predicting the efficiency of application and distribution of layer thickness of pneumatically applied spray lacqueringDOMNICK, J; SOMMERFELD, M; LINDENTHAL, A et al.Metalloberfläche. 1996, Vol 50, Num 12, pp 976-979, issn 0026-0797Article

ETUDE HOLOGRAPHIQUE DE LA PULVERISATION TRES FINE DANS UN BRULEUR A INJECTION TOURBILLONNAIRE. = HOLOGRAPHIE STUDY OF FINE PULVERIZATION IN A TURBULENT INJECTION BORNERCOULON C; ROYER H.1975; ISL-2-75; FR.; DA. 1975; PP. 1-22; H.T. 17; ABS. ALLEM.; BIBL. 9 REF.Report

Les cahiers du peinturage industriel = Industrial painting booksKUPS, S.Galvano organo traitements de surface. 1999, Vol 68, Num 697, pp 663-666, issn 0982-7870Article

TEMPERATURE RISE DURING FILM DEPOSITION BY RF AND DC SPUTTERINGLAU SS; MILLS RH; MUTH DG et al.1972; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1972; VOL. 9; NO 4; PP. 1196-1202; BIBL. 13 REF.Serial Issue

CROISSANCE DE COUCHE MINCE DE TANTALE PAR PULVERISATION HFFUJIOKA T; FUJINAMI T.1972; J. VACUUM SOC JAP.; JAP.; DA. 1972; VOL. 15; NO 10; PP. 362-368; BIBL. 7 REF.Serial Issue

PROPERTIES OF ZIRCONIUM NITRIDE FILM RESISTORS DEPOSITED BY REACTIVE RF SPUTTERING.IZUMI K; MASANOBU T; ARIYOSHI H et al.1975; I.E.E.E. TRANS. PARTS HYBRID. PACKAG.; U.S.A.; DA. 1975; VOL. 11; NO 2; PP. 105-107; BIBL. 8 REF.Article

PBTE RF-SPUTTERED INFRARED DETECTORS.CORSI C.1974; APPL. PHYS. LETTERS; U.S.A.; DA. 1974; VOL. 24; NO 3; PP. 137-139; BIBL. 18 REF.Article

ETUDE PAR SPECTROMETRIE DE MASSE DE LA PULVERISATION CATHODIQUE REACTIVE HAUTE FREQUENCESHINOKI F.1977; BULL. ELECTROTECH. LAB.; JAP.; DA. 1977; VOL. 41; NO 8; PP. 64-70; ABS. ANGL.; BIBL. 16 REF.Article

THE INFLUENCE OF SPUTTERING AND TRANSPORT MECHANISMS ON TARGET ETCHING AND THIN FILMS GROWTH IN RF SYSTEMS. II. TRANSPORT AND DEPOSITION PROCESSESHOLLAND L; PRIESTLAND CRD.1972; VACUUM; G.B.; DA. 1972; VOL. 22; NO 4; PP. 143-149; BIBL. 19 REF.Serial Issue

MECHANISM OF RF REACTIVE SPUTTERINGSHINOKI F; ITOH A.1975; J. APPL. PHYS.; U.S.A.; DA. 1975; VOL. 46; NO 8; PP. 3381-3384; BIBL. 10 REF.Article

A study of the process pressure influence in reactive sputtering aiming at hysteresis eliminationSÄRHAMMAR, E; STRIJCKMANS, K; NYBERG, T et al.Surface & coatings technology. 2013, Vol 232, pp 357-361, issn 0257-8972, 5 p.Article

Ionenätzen in der Metallographie = Ion etching in metallographyPOHL, M.Zeitschrift für Metallkunde. 1995, Vol 86, Num 1, pp 22-26, issn 0044-3093Article

Criterion analysis on nonpoisoning of the target surfaceJINGYI WANG; WEI CHEN; YU WANG et al.Journal of applied physics. 1993, Vol 73, Num 5, pp 2518-2523, issn 0021-8979Article

Reactive ion beam deposition of aluminum nitride thin filmsBHAT, S; ASHOK, S; FONASH, S. J et al.Journal of electronic materials. 1985, Vol 14, Num 4, pp 405-418, issn 0361-5235Article

Modeling of mass transport and gas kinetics of the reactive sputtering processBERG, S; NENDER, C.Journal de physique. IV. 1995, Vol 5, Num 5, pp C5.45-C5.54, issn 1155-4339, 1Conference Paper

Chrome coatings with the aid of magnetrone ione powder coatingTODOROVA, S; DOCHEV, D; KYNEV, M et al.1985, Vol 34, Num 11, pp 505-507, issn 0025-455XArticle

Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targetsKUBART, Iomáš; CADA, Martin; LUNDIN, Daniel et al.Surface & coatings technology. 2014, Vol 238, pp 152-157, issn 0257-8972, 6 p.Article

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